MSE-411-nandita-2026-06-02-11-35-33

Below is a syllabus template that includes WSU's required syllabus elements. Please complete all items highlighted in yellow. 

 

Title of Course : Semiconductor Processing and Fabrication

Prefix and Number MSE 411

Semester and Year: Fall 2027

Number of Credit Hours: 3

Prerequisites/co-requisites: MSE 302 or instructor’s permission

Course Details

Day and Time: 2 hour lecture and 1 hour lab

Meeting Location: [tbd]

 

Instructor Contact Information

Instructor Name: [tbd]

Instructor Contact Information: [office location, phone, email] [tbd]

Instructor Office Hours: [click here for best practices] [tbd]

 

TA Name: [tbd]

TA Contact Information: [office location, phone, email]: [tbd]

TA Office Hours: [click here for best practices] [tbd]

 

Course Description

Introduction of semiconductors and semiconductor fabrication process. Include Oxidation, diffusion, photolithography, Plasma and Acid etching, thin film deposition, Device fabrication. 

 

Course Materials 

Text Books: 

Fundamentals of Semiconductor Processing Technologies, Badih El-Kareh, Kluwer Academic Publishers.

Required and/ or recommended materials

1. Introduction to Microfabrication”, Franssila, Sami. Available through WSU libraries.
2. Honsberg, C., and S. Bowden. Photovoltaics: Devices, Systems and Applications CD-ROM. [A free online resource.]
3. The Science and Engineering of Microelectronic Fabrication, 2nd

              Edition, Campbell, S.A. , Oxford University Press.

4. Fundamentals of Microfabrication, 2nd Edition, Madoum M. , CRC Press

Other Materials: N/A

Fees: N/A

Student Learning Outcomes (SLOs) [add more lines if necessary]

Course Learning Outcomes (students will be able to:)	Activities Supporting the Learning Outcomes	Assessment of the Learning Outcomes
Demonstrate knowledge of nanofabrication fabrication processes	Homework, Quizzes and Exams	Homework, Quizzes and Exams
Demonstrate knowledge of photovoltaic cells	Homework, Quizzes and Exams	Homework, Quizzes and Exams
Demonstrate knowledge role of dopants in electrical properties of materials	[Homework, Quizzes and Exams	Homework, Quizzes and Exams
Demonstrate calculation of dopant diffusion	Homework, Quizzes and Exams	Homework, Quizzes and Exams
Demonstrate knowledge of the principles of operation of a p-n junction	Homework, Quizzes and Exams	Homework, Quizzes and Exams
Demonstrate basic knowledge of the processing steps in modern semiconductor fabrication techniques	Homework, Quizzes and Exams	Homework, Quizzes and Exams

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Course Schedule

[Please note that a WSU semester is 15 weeks + Thanksgiving/Spring Break. The schedule below does not include the break.]

Dates	Lesson Topic	Assignment	Assessment
Week 1 Aug 18	Admin/expectations/overview, introduction to micro-fab, cleanrooms (safety and RCA clean)-lab, Introduction of Crystal growth, Semiconductor materials (elemental, compound)	Team formed for project, Cleanroom safety orientation completed, HW #1 assigned	HW 1
Week 2 Aug 25	Oxidation and Nitridation SiO2 and SiO2-Si interface, Thermal oxidation, Silicon nitride.	Literature review and project topic submission, In-class participation activities	Project Topic
Week 3 Sep 1	DC/RF deposition PVD deposition – thermal, e-beam, PLD	Preliminary process flow development, HW #1 due	HW 1
Week 4 Sep 8	Chemical vapor deposition, Spin coat, Optical lithography	Photolithography process plan submission, HW #2 assigned	HW 2
Week 5 Sep 15	Chemical vapor deposition: MOCVD, MBE	Quiz #1, Project progress discussion	Quiz 1
Week 6 Sep 22	Lithography: optical lithography, Photomask, Photoresist, Dimensional control and alignment.	Mask design and fabrication workflow submission, HW #2 due	Design submission, HW 2
Week 7 Sep 29	X-ray, electron, Ion beam lithography RTP diffusion, wafer clean process	Mid-project technical progress review	Process Integration Review
Week 8 Oct 6	Wet etch process, Photolithography, Dry Etching-1	Etching process documentation submitted, HW #3 assigned	HW 3
Week 9 Oct 13	Dry Etching-2, Backside metallization- thin film deposit, Software exposure	Quiz #2, Process integration update, Midterm exam.	Midterm Exam
Week 10 Oct 20	Device (PN, CMOS, MEMS), Back silicide Al Ion implantation	Device fabrication process report submitted, HW #4 assigned	HW 4
Week 11 Oct 27	Ion implantation, crystal damage and dopant activity	Diffusion and implantation analysis completed	Device Fabrication Review
Week 12 Nov 3	Diffusion: Diffusion from constant source and continuous source.	HW #5 assigned, Final process integration plan submitted	HW 5
Week 13 Nov 10	Metrology and Characterization	Preliminary characterization results presented	The characterization review
Week 14 Nov 17	Analytical Characterization (AFM, SEM and TEM)	Quiz #3, Final characterization analysis submitted	Quiz
Week 15 Nov 24	Thanksgiving Break	Thanksgiving Break
Week 16 Dec 1	Final Week	Final exam	Final Exam

 

 

Expectations for Student Effort 

For each hour of lecture equivalent, students should expect to have a minimum of two hours of work outside of class.

 

Grading [add more lines if necessary]

Assignment Breakdown

Type of Assignment (tests, papers, etc)	Points	Percent of Overall Grade
HW	50	11.11
Labs	140	31,11
Quiz	60	13.33
Exams	200	44.44
Total	450	100

 

Grading Schema

Grade	Percent	Grade	Percent
A	90-100	C	70-75.9
A-	88-89.9	C-	66-69.9
B+	86-87.9	D+	63-65.9
B	80-85.9	D	60-62.9
B-	78-79.9	F	59.9 and below
C+	76-77.9

[Provide information about how grades will be rounded (eg, if 89% earns a B+ and 90% earns an A-, what grade is given to a student with an 89.5?]

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Attendance and Make-Up Policy 

Students are expected to attend all classes unless otherwise approved by WSU policy. Some of the lecture material is not contained in the text, therefore it is in your best interests to attend.  The text is more detailed on some subjects than I will expect you to know, so attending class will let you see which parts are emphasized.  If you miss class, you are expected to get the notes from a classmate, not from the professor or TA.

 

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Academic Integrity Statement

“You are responsible for reading WSU’s Academic Integrity Policy, which is based on Washington State law. If you cheat in your work in this class you will: 

• Fail the course
• Be reported to the Center for Community Standards.
• Have the right to appeal my decision.
• Not be able to drop the course or withdraw from the course until the appeals process is finished.  

If you have any questions about what you can and cannot do in this course, ask me.

If you want to ask for a change in my decision about academic integrity, use the form at the Center for Community Standards website. You must submit this request within 21 calendar days of the decision.”

University syllabus statement

Students are responsible for reading and understanding all university-wide policies and resources pertaining to all courses (for instance: accommodations, care resources, policies on discrimination or harassment), which can be found in the university syllabus.

Use of AI policies:

Students may use AI tools to support their work; however, they are responsible for verifying the accuracy and reliability of any AI-generated information. All original references must be properly cited in Chicago style, and a PDF copy of each source must be uploaded along with the submission. Slides must be prepared using the course template provided by the instructor. The template may not be uploaded to any AI tools, and students are required to create their PowerPoint presentations independently. Submissions that violate AI policies will automatically receive zero grade.